The spaces of the Nano Fabrication Facility are further enlarged: a new laboratory has been created for the facility, at the MM building, dedicated to tubular furnaces, for the oxidation processes of silicon and for the production of Glassy Carbon.
The maximum temperature of the furnaces is 1200 ° C; the gases available are currently O2, N2 and Ar.
Dry or wet oxidation modes are available for the oxidation of silicon.