The Micro- and Nano fabrication facility at IOM comprises three separate areas in cleanroom ranging from ISO5 to ISO7

A ISO7 CR (Optical Lithography & etching lab) is fully equipped for resist deposition, UV lithography and a chemical hood for sample cleanining and development. Two mask aligner for 3” and 4” wafer are available for UV lithography (single and double side exposure), with resolution down to 1 micron. A maskless lithography system is also available for areas up to 2" and with about 5 um resolution. All the complementay tools for preparation and control are available: spin coater, hot-plates; an optical microscope (with optional UV filter), optical and stylus profilometer, plus a RIE for oxygen plasma cleanining and descum.

In a separate ISO 6/5 CR, (EBL lab) two EBL system allow feature sizes down to sub-10 nm, on up to 6" wafers; the Nano Imprint Lithography (NIL) setups permit to imprint up to 5" samples.  Also the EBL lab is equipped with spin coater, hot plates, wet bench and optical microscope.  A SEM comlements the metrology and process control equipment.

UV litography

• Karl Suss MJB3
• Karl Suss MA25
• Microlight3D Smartprint

Electron Beam Lithography

• Raith Voyager
• ZEISS Sigma 300 equipped with RAITH Elphy quantum

Nano Imprinting

• Thermal NIL
• UV-NIL
• ThunderNIL

Interference Lithography

• LIL