The Micro- and Nano fabrication facility at IOM comprises three separate areas in cleanroom ranging from class 10 to 10000.

A first Class 100 CR ( Optical Lithography lab ) is fully equipped for resist deposition, lithography, optical microscope and suitable chemical hood for the lithographic develop processes and wet sample cleaning. Two mask aligner for 3” and 4” wafer are available for optical lithography, allowing a resolution of 1 micron. All the tools for sample handling and preparation are available: a Class 10 laminar flow hood hosts a spin coater and fine controlled hot-plates; an optical microscope for sample characterisation and profilometer.

Inside the class 10 CR, the Nano Imprinting (NIL) setup permits to employ the moulds with a size up to 5".

UV litography

• Karl Suss MJB3
• Karl Suss MA25

Electron Beam Lithography

• ZEISS LEO 1540 equipped with RAITH pattern generator
• ZEISS Sigma 300 equipped with RAITH Elphy quantum

Focused Ion Beam

• ZEISS LEO 1540 with GEMINI Column

Nano Imprinting

• Thermal NIL
• UV-NIL
• ThunderNIL

Interference Lithography

• LIL