We are excited to announce the availability of a brand-new UV Nanoimprint Lithography (UV-NIL) system at the FNF.

This fully custom system was entirely designed and built in-house at our institute, showcasing the synergy between mechanical, electronic, and nanofabrication expertise. The setup includes a semi-automated pneumatic press capable of imprinting substrates up to 3 inches in diameter.

A standout feature of the system is the custom-designed UV light source, entirely developed and realized by our Electronics Technical Lab — with special recognition to Andrea Martin for his outstanding work.

The illumination system consists of two twin arrays of UV LEDs operating at 365 nm and 405 nm, providing high-intensity output. A dedicated controller allows for precise exposure timing and fine adjustment of emission power, ensuring excellent reproducibility and process control.

Initial tests confirm the high performance of the system: nanostructures fabricated by Vittorio Apolloni using a mould produced via electron beam lithography and dry etching demonstrate excellent pattern fidelity and uniformity.

This new tool enhances our capabilities in UV-NIL and reinforces FNF’s commitment to in-house innovation and advanced nanofabrication processes.